JPH0560584B2 - - Google Patents

Info

Publication number
JPH0560584B2
JPH0560584B2 JP15944485A JP15944485A JPH0560584B2 JP H0560584 B2 JPH0560584 B2 JP H0560584B2 JP 15944485 A JP15944485 A JP 15944485A JP 15944485 A JP15944485 A JP 15944485A JP H0560584 B2 JPH0560584 B2 JP H0560584B2
Authority
JP
Japan
Prior art keywords
alignment
glaze
substrate
pattern
key
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP15944485A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6219856A (ja
Inventor
Takanari Nagahata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP60159444A priority Critical patent/JPS6219856A/ja
Publication of JPS6219856A publication Critical patent/JPS6219856A/ja
Publication of JPH0560584B2 publication Critical patent/JPH0560584B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electronic Switches (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60159444A 1985-07-18 1985-07-18 パタ−ン被形成基板の位置合わせ方法 Granted JPS6219856A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60159444A JPS6219856A (ja) 1985-07-18 1985-07-18 パタ−ン被形成基板の位置合わせ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60159444A JPS6219856A (ja) 1985-07-18 1985-07-18 パタ−ン被形成基板の位置合わせ方法

Publications (2)

Publication Number Publication Date
JPS6219856A JPS6219856A (ja) 1987-01-28
JPH0560584B2 true JPH0560584B2 (en]) 1993-09-02

Family

ID=15693885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60159444A Granted JPS6219856A (ja) 1985-07-18 1985-07-18 パタ−ン被形成基板の位置合わせ方法

Country Status (1)

Country Link
JP (1) JPS6219856A (en])

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0246458A (ja) * 1988-08-08 1990-02-15 Nec Corp マスク目合せパターン
JPH07106194B2 (ja) * 1989-06-26 1995-11-15 鐘紡株式会社 皮膚特性チェック装置
WO2012133760A1 (ja) * 2011-03-30 2012-10-04 ボンドテック株式会社 電子部品実装方法、電子部品実装システムおよび基板
CN106004096B (zh) * 2016-05-13 2018-05-04 清华大学深圳研究生院 一种用于打印石英晶体传感器敏感层的喷墨打印托盘
CN109358475A (zh) * 2018-12-05 2019-02-19 全普光电科技(上海)有限公司 对准标记、掩膜版及其制备方法
JP7496710B2 (ja) * 2020-04-28 2024-06-07 ローム株式会社 サーマルプリントヘッドの製造方法

Also Published As

Publication number Publication date
JPS6219856A (ja) 1987-01-28

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees